Comments by "kazedcat" (@kazedcat) on "What ASML Has Next After EUV" video.

  1. If you think EUV optics is crazy then X-ray optics is a lot more crazy. The resist is even more problematic with X-rays. You have backscattering and the photons are energetic enough to alter and cook your substrate.
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  2. They are doing weird things to the light source to get the highest contrast possible and this puts a lot of constraints in the optics geometry. There is just no other way. The main constraint is the intensity of the source itself. Brighter source allows faster exposure. But the intensity is already fix because of how the EUV is generated so they have to resort to optics jujitsu.
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  3. This are work by hundreds of engineers from all over the world. Improving fabrication technology is a global effort.
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  4. There is e-beam lithography but that is a lot slower than EUV order of magnitude slower even if they figure out the multi beam version.
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  5. Lasers. I am not 100% sure but precision equipment got to have lasers somewhere.
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  6. High NA have 16nm resolution. Double patterning gets you to 8 nm resolutionand quadruple patterning gives you 4nm. I think they will stay with EUV and just enlarge the reticle. Fabs will have to use multi patterning to get to smaller resolution.
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  7. Atomic deposition has been around for a long time. With it you can deposit a layer of material 1 atom thick. Mirrors also needs a perfect shape so it is highly likely that the aberrations specs are derive from the mirrors geometric shape.
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  8. Yes this machines has been planned for decades. The industry itself have schedules and roadmaps that everyone agrees on and they have regular meetings that updates the schedules and roadmaps With any unexpected factors
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