Comments by "Anik Samiur Rahman" (@aniksamiurrahman6365) on "ASML's High-NA EUV Lithography: A 2024 Update" video.

  1. I consider such a bleak situation. That there's no competitor of ASML-Karl Zeiss duo, and whoever controls this duo also controls world availability of such important products.
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  2.  @MrSpiritmonger  China worked out the light source. But the optics is where they are lagging.
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  3.  @MrSpiritmonger  Not western news source. It's my own assessment based on all the news of Chinese FEL (Free electron Laser) based lithography I could gather. In fact no one yet quite figured out the FEL based lithography. Only the FEL light source is available for now.
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  4. Well, there's no competitor anyway.
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  5. ​ @kyazumizerk9270  I just don't understand, where does these cope comes from? You guys can't match China's progress. So, is these BS is what you're left with?
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  6.  @kyazumizerk9270  They are finalizing XFEL tech for EUV generation. The light source is done (published report is there), the optics is being worked on. No catching up game, straight out bypassing ASML. Just so u kno, XFEL is a 4th gen light source, the most intense there is.
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