Comments by "alex Lo" (@alexlo7708) on "EUV’s Most Difficult Challenge" video.

  1. I wonder why they are preoccupied by EUV approach. Indulgent in this way make them confuse in complex probelms on each step in process. While some others initiate other way such leap to intense invest in X-rays lithography. X-rays lithography reduces or eleminates many steps problem occuring in EUV such mirror lens energy loss and precision control of the focus. While left problem to solve only photo resist chemical that abides to the energy level while movement precision are not stricted required because the light is so thin than error coverage. I think American knew it well , but kept it secret and made people in industry waste their effort and lost its way and time. This will keep American in going ahead of others.
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  2.  @tommy2cents492  Requirement in process are comply by your approach. If you chosse the complex way, yes, you face many problems. US has gone to growth diamond wafer and testing gamma photon light. Thats why they discover as they semi telling out that expose diamond to gamma rays ,will occuring electric current.
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