Comments by "kazedcat" (@kazedcat) on "ASML's High-NA and Hyper-NA EUV: An Update" video.

  1. Tooling is highly reusable while the mask is consumable. Every new chip design needs several hundred different masks but you can reuse the EUV scanner.
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  2.  @h9hkk6155  maybe nano imprint if they can make that work. But multi-patterning is shoe in for future improvements.
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  3.  @TheEVEInspiration  High resolution scanner are use for critical features but lesser resolution scanners are also use for less critical features. For example 7N process uses an EUV scanner for only the first 2 metal layers while DUV scanners are used for the rest of the 12 to 15 metal layers. The same thing will happen with High NA EUV. At first they will only be used for a few layers while Low NA EUV will be reused for the other layers. Then when Hyper NA becomes available the High NA EUV scanner will be reused for less critical layers.
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  4. Nothing, it is going to be multi- patterning all the way down.
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