Comments by "kazedcat" (@kazedcat) on "How ASML Builds a $150 Million EUV Machine" video.

  1. The parts are not off the shelf component. They are custom parts tailored to ASML's design. The design itself is the outcome of a multi year research and development.
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  2. No EUV use gravity to drop a droplet of molten tin which is then vaporized with high intensity laser. Doing it in 0g makes the process of hitting a droplet of molten tin with lasers a lot harder because the droplet will float into random direction.
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  3. linkzable I just read the article on soft x-ray it is not even lithography just x-ray imaging. X-ray imaging is the device use in hospitals to see your skeleton. It is a completely different technology. Yes now you can see your bones at a higher resolution but you cannot use it to manufacture microchips. Even the optics use for imaging is completely different to the optics use for lithography. And then where is the technology for x-ray mask. Where is the technology for x-ray photoresists. Where is the technology for 2nm features overlay. Where is the technology for x-ray aberration correction. Lithography is not just firing lasers in fact firing lasers is the most trivial component in lithography.
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  4. linkzable Your contacts are idiots. Again where is the x-ray mask technology. Where is the x- ray photoresists technology. Where is the overlay technology. Where is the aberration correction technology. If they think lasers = lithography then they are dumber than a glue sniffing monkey. And since you believe their rambling induced by their glue sniffing high your intelligence must be even lower than theirs.
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  5. E beam lithography is to slow. It is good for laboratory prototypes but not for mass production.
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  6. linkzable Your X-ray laser was actually X-ray imaging not lithography and it is laboratory demonstration very far from mass production. China have no EUV technology. This industry cannot be forced with simple manpower. You need brains not muscle given China's severe corruption in academia smart people don't actually rise to the top to lead the research. China actually have to poach Taiwanese engineers to run their foundries. Then corruption sets in and the Taiwanese engineers quit because of unpaid salary. China is using speed to hand over billions to scammers who pocketed the money
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  7. b Low China needs to spend 10x of the entire silicon industry if they want to realistically catch-up and not take a decade to develop the technology that will be a decade old by time they manage to replicate it. So start counting the total combine R&D budget of Apple, Intel, Samsung, TSMC, IBM, Qualcomm and others. Multiply that by 10 and that should be the budget China needs to allocate to catch-up.
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  8. Vent Fin Not likely in the short term. It would take several years for them to match the current state of the art machines. But at that time the industry have move on into more advance technology. Technology research is not stopping and the entire industry is spending multibillion dollars to advance forward. For China to actually catch-up they need to spend 10 times as much as the entire industry. Eventually we will reach the scale of single atom transistor that will be the time China will catch-up when physics itself is preventing the industry from moving forward.
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  9. linkzable linkzable Please stop commenting on technology you don't understand. Photoresist use different chemical depending on your photon wavelength. 14 nm DUV scanner is advance clean air chamber and optical lenses. 5nm EUV scanner is vacuum chamber and mirrors. X-ray would need exotic meta material. The archeticture between DUV and EUV is completely different you are actually asking if you can build a fishing boat why can't you build a passenger aircraft they both carry people so boat builders should have all the knowledge of building a plane. A completely moronic question.
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  10. nzoomed The photoresists needs time to develop so e beam scanning is limited by the photoresist.
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  11. You need to consider that ASML is not standing still. Already they are moving to a more advance High NA EUV scanner they also have upgrades for increase throughput. China may have plans to get into EUV but that is not the finish line.
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  12. linkzable Prototype vs. Production. E beam lithography already exist which is better than x-ray lithography. IBM has already demonstrated single atom features decades ago. ASML equipment is for high volume mass production. Currently millions of microchip fabricated using 13nm EUV is being delivered into customers hand not one off lab prototype that IBM already exceeded for already a decade. So how many microchip using 2nm X-ray lithography has China produce? Have they even built a working processor? Or is it just demonstrating that they can draw grid lines using X-ray.
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  13. Edu Wino That is why I assigned a 10x multiplier instead of just 2x. It factors in the inefficiency inherent in the system.
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  14. Search YouTube for EUV Scanner
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  15. nzoomed There are some research on using multiple e beam to speed up scanning but I don't think it can compete with the speed of photolithography. Using it to create mask is okay because mask is reuse several hundred times so output is amplified.
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  16.  @nzoomed  Photoresist is driven by chemical reaction. Faster reaction means less precision which is what you want by using e beam.
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  17. They could not buy the machines to reverse engineer.
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