Comments by "genuinenness befitting" (@genuinennessbefitting4734) on "China's "Diversionary" War with Taiwan: The Good, Bad and Ugly || Peter Zeihan" video.

  1.  @TheDavemarz  Even if EUV is purchased, advanced chips cannot be mass-produced with a high yield rate. EUV uses TSMC's wet technology and is developed at F12b, TSMC's Hsinchu headquarters. TSMC modified the purchased EUV and redesigned the reflective structure to increase the reflectivity from 2% to 3% and increase the efficiency by 50%. TSMC's dry EUV mask cleaning technology reduces exposure to dust particles from hundreds to single digits per 10,000 wafers, a 99% reduction in dust ratios. ASML's latest EUV light source output power is 350W, but TSMC has begun using its own improved 350W EUV in 2020.
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