Comments by "genuinenness befitting" (@genuinennessbefitting4734) on "Secretive Giant TSMC’s $100 Billion Plan To Fix The Chip Shortage" video.

  1.  @spydude38  We have no lab in the US. P8 completes a few months later in Hsin Chu, 8000 scientists are working there. 3 nm has already try run from early May.
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  2.  @tomservo5007 Do you even know how many R&D guys and how many chained suppliers are involved? Less than 10% of the technology of 5 nm has relation to the US technology; for 3 nm, the link is even lesser; by the time TSMC producing a 1 nm chip, 100% of technology will have nothing to do with the US.
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  3.  @thejeffinvade  The way to make smaller chips like FINFET was invented by Dr. Chengmin Hu from Taiwan; the wet etching in lithography was developed by Burn. J. Lin, the deputy general manager of TSMC, which makes ASML surpass Nikon and Cannon, Taiwanese, contributed many breakthroughs in chip technology. EUV was developed in F12 of TSMC; Engineers from TSMC are still in charge of the research in ASML.
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  4. The wet etching in lithography was developed by Burn. J. Lin, the deputy general manager of TSMC, which makes ASML surpass Nikon and Cannon, Taiwanese, contributed many breakthroughs in chip technology. EUV was developed in F12 of TSMC; Engineers from TSMC are still in charge of the research in ASML.
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  5. You are correct.
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  6. The wet etching in lithography was developed by Burn. J. Lin, the deputy general manager of TSMC, which makes ASML surpass Nikon and Cannon, Taiwanese, contributed many breakthroughs in chip technology. EUV was developed in F12 of TSMC; Engineers from TSMC are still in charge of the research in ASML.
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  7. It's too complicated; there are thousands of manufacturing steps. TSMC will let any American sit in the cleanroom, but they still can't understand the whole procedure; chip manufacturing is not easy.
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  8. The 5 nm technology has less than 10% relates to the US. The 3 nm chip has an even lesser connection with any US technology. So we can foresee 1 nm will be like 100% technology from Taiwan.
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  9. The wet etching in lithography was developed by Burn. J. Lin, the deputy general manager of TSMC, which makes ASML surpass Nikon and Cannon, Taiwanese, contributed many breakthroughs in chip technology. EUV was developed in F12 of TSMC; Engineers from TSMC are still in charge of the research in ASML.
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  10. Why does Intel place 14 billion worth of orders to TSMC if Intel can make a 3 nm chip?
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